Senior Process Engineer
Materials Science · China · 2025-07-02
Proposed Endeavor
The petitioner proposes to develop and improve advanced semiconductor area selective deposition processes to enable fabrication at nodes beyond 3 nanometers. This work involves creating novel selective deposition techniques to reduce oxidation damage to metal lines and enhance low-k dielectric material performance. The goal is to improve power consumption, device performance, and integration density while lowering manufacturing costs and increasing throughput.
Framework Evaluation
3 of 3 criteria metThe work addresses key manufacturing challenges in the semiconductor industry, which is essential for U.S. technological competitiveness.
The petitioner's extensive publication record, patent, and high citation count demonstrate a track record of success in materials science.
The petitioner's unique expertise in selective deposition processes provides a benefit to the U.S. that outweighs the need for labor certification.
Why This Petition Was Approved
Evidence
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